Photochemical reaction of polymers used as resists by 146-nm light exposure

Journal of Photopolymer Science and Technology

Volumn 12, Issue 5, 1999, Pages 717-720

  Kishimura, Shinji ^a,b   Sasago, Masaru ^a   Shirai, Masamitsu ^a   Tsunooka, Masahiro ^a  

^a PANASONIC CORPORATION   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000837945     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.717     Document Type: Article

References (6)

1. M. Sasago, J. Photopolym. Sci. Technol, 12 (1999) 585.
2. R. R. Kunz, T. M. Bloomstein, D. E. Hardy, R. B. Goodman, D. K. Downs, and J. E. Curtin, Proc. SPIE, 3678(1999) 13.
3. S. Kishimura, A. Katsuyama, M. Sasago, M. Shirai, and M. Tsunooka, Jpn. J. Appl. Phys., in press.
4. H. Ito, Proc. SPIE, 3678 ( 1999) 2.
5. A. Reiser, Photoreactive Polymers, John Wiley & Sons, New York (1989) p.313.
6. J. F. Rabek, Mechanisms of Photophysical Process and Photochemical Reactions in Polymers, John Wiley & Sons, New York (1987) p.528.