Characterization and modeling of volumetric and mechanical properties for step and flash imprint lithography photopolymers

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2685-2689

  Colburn, Matthew ^a   Suez, Itai ^a   Choi, Byung Jin ^a   Meissl, Mario ^a   Bailey, Todd ^a   Sreenivasan, S V ^a   Ekerdt, John G ^a   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BOUNDARY CONDITIONS; COMPUTER SIMULATION; DENSIFICATION; FINITE ELEMENT METHOD; INDENTATION; LITHOGRAPHY; MECHANICAL PROPERTIES; MONOMERS; REGRESSION ANALYSIS; TEMPERATURE; VECTORS;

NANOINDENTATION; PHOTOPOLYMERS; PSEUDOCOEFFICIENTS OF THERMAL EXPANSION; STEP AND FLASH IMPRINT LITHOGRAPHY; VOLUMETRIC SHRINKAGE;

PHOTOPOLYMERIZATION;

EID: 0035519764     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1420199     Document Type: Article

References (6)

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6. K. L. Johnson, Contact Mechanics (Cambridge University Press, Cambridge, 1987).