A study of photoresist pattern freezing for double imaging using 172nm VUV flood exposure

Journal of Photopolymer Science and Technology

Volumn 21, Issue 5, 2008, Pages 697-704

  Yamaguchi, Masanori ^a   Wallow, Thomas ^b   Yamada, Yohei ^a   Kim, Ryoung Han ^b   Kye, Jongwook ^b   Levinson, Harry J ^b  

^a USHIO INC   (Japan)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

172nm cure; Double patterning; Pattern distortion; Resist stabilization

Indexed keywords

EID: 51549099010     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.697     Document Type: Article

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