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Volumn 5, Issue 4, 2006, Pages

Investigation of possible ArF resist slimming mechanisms

Author keywords

193 nm resist; Blanket; Carbonyl; Exposure; Heating; Mechanism; SEM; Shrinkage

Indexed keywords

ARGON; CURING; ELECTROMAGNETIC WAVES; ELECTRON BEAMS; HEATING; SCANNING ELECTRON MICROSCOPY; SHRINKAGE;

EID: 33947104279     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2399525     Document Type: Article
Times cited : (5)

References (6)
  • 2
    • 0036031377 scopus 로고    scopus 로고
    • 193-nm CD shrinkage under SEM: Modeling the mechanism
    • A. Habermas, D. Hong, M. Ross, and W. Livesay, "193-nm CD shrinkage under SEM: Modeling the mechanism," Proc. SPIE 4689, 92-101 (2002).
    • (2002) Proc. SPIE , vol.4689 , pp. 92-101
    • Habermas, A.1    Hong, D.2    Ross, M.3    Livesay, W.4
  • 3
    • 0036030238 scopus 로고    scopus 로고
    • Three-dimensional aspects of the shrinking phenomenon of ArF resist
    • I. Laufer, G. Eytan, and O. Dror, "Three-dimensional aspects of the shrinking phenomenon of ArF resist," Proc. SPIE 4689, 841-845 (2002).
    • (2002) Proc. SPIE , vol.4689 , pp. 841-845
    • Laufer, I.1    Eytan, G.2    Dror, O.3
  • 4
    • 0034757314 scopus 로고    scopus 로고
    • Investigation of the mechanism of the 193-nm resist line-width reduction during the SEM measurement
    • C.-H. J. Wu, W.-S. Huang, K.-J. R. Chen, C. N. Archie, and M. E. Lagus, "Investigation of the mechanism of the 193-nm resist line-width reduction during the SEM measurement," Proc. SPIE 4345, 190-199 (2001).
    • (2001) Proc. SPIE , vol.4345 , pp. 190-199
    • Wu, C.-H.J.1    Huang, W.-S.2    Chen, K.-J.R.3    Archie, C.N.4    Lagus, M.E.5
  • 5
    • 0034756480 scopus 로고    scopus 로고
    • Mechanism studies of scanning electron microscope measurement effects on 193-nm photoresists and the development of improved line width measurement methods
    • T. Sarubbi, M. Ross, N. Neisser, T. Kocab, B. Beauchemin, W. Livesay, S. Wong, and W. Ng, "Mechanism studies of scanning electron microscope measurement effects on 193-nm photoresists and the development of improved line width measurement methods," Proc. SPIE 4345, 211-221 (2001).
    • (2001) Proc. SPIE , vol.4345 , pp. 211-221
    • Sarubbi, T.1    Ross, M.2    Neisser, N.3    Kocab, T.4    Beauchemin, B.5    Livesay, W.6    Wong, S.7    Ng, W.8


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.