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Volumn 6923, Issue , 2008, Pages
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Resist freezing process for double exposure lithography
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Author keywords
Pitch splitting; Post develop bake; Resist on resist double exposure
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Indexed keywords
DOUBLE EXPOSURE LITHOGRAPHIES;
DOUBLE EXPOSURES;
FORMULATION OPTIMIZATIONS;
FREEZING PROCESSES;
HIGHER TEMPERATURES;
PITCH SPLITTING;
POSITIVE RESISTS;
POST DEVELOP BAKE;
RESIST-ON-RESIST DOUBLE EXPOSURE;
SOLVENT SOLUBILITIES;
SWITCH CHARACTERISTICS;
PHOTOLITHOGRAPHY;
POLYMERS;
TURBULENT FLOW;
FREEZING;
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EID: 51549089971
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.772852 Document Type: Conference Paper |
Times cited : (40)
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References (6)
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