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Volumn 6923, Issue , 2008, Pages

Resist freezing process for double exposure lithography

Author keywords

Pitch splitting; Post develop bake; Resist on resist double exposure

Indexed keywords

DOUBLE EXPOSURE LITHOGRAPHIES; DOUBLE EXPOSURES; FORMULATION OPTIMIZATIONS; FREEZING PROCESSES; HIGHER TEMPERATURES; PITCH SPLITTING; POSITIVE RESISTS; POST DEVELOP BAKE; RESIST-ON-RESIST DOUBLE EXPOSURE; SOLVENT SOLUBILITIES; SWITCH CHARACTERISTICS;

EID: 51549089971     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772852     Document Type: Conference Paper
Times cited : (40)

References (6)
  • 1
    • 38849091281 scopus 로고    scopus 로고
    • 32 nm Marked by Litho, Transistor Changes
    • Jan. 1
    • Peters, L., "32 nm Marked by Litho, Transistor Changes," Semiconductor International, Jan. 1(2008).
    • (2008) Semiconductor International
    • Peters, L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.