Nanopatterning with 248 nm photolithography by photostabilizing bilayer photoresists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 2, 2007, Pages 426-429

  Tsai, F Y ^a   Jhuo, S J ^a   Lee, J T ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b Headway Technologies Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BILAYER PHOTORESIST STRUCTURES; PHOTOSTABILIZING BILAYER PHOTORESISTS;

DRY ETCHING; HIGH TEMPERATURE EFFECTS; PHOTOLITHOGRAPHY; PHOTORESISTS; ULTRAVIOLET RADIATION;

PATTERN RECOGNITION;

EID: 34047128706     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2713404     Document Type: Article

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