Investigation on the mechanism of the 193nm resist linewidth reduction during the SEM measurement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue I, 2001, Pages 190-199

  Wu, C H J ^a   Huang, W S ^a   Chen, K J R ^a   Archie, C N ^a   Lagus, M E ^a  

^a IBM RESEARCH   (United States)

Author keywords

193nm resist; AFM; Line slimming; Mechanism; SEM

Indexed keywords

ALGORITHMS; CROSSLINKING; ELECTRON BEAMS; PLASTIC FILMS; SCANNING ELECTRON MICROSCOPY; SHRINKAGE;

SINGLE LAYER RESISTS (SLR);

PHOTORESISTS;

EID: 0034757314     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436848     Document Type: Conference Paper

References (6)