Mechanistic studies on the CD degradation of 193 nm resists during SEM inspection

Journal of Photopolymer Science and Technology

Volumn 14, Issue 3, 2001, Pages 407-417

  Kudo, Takanori ^a   Dammel, Ralph R ^a   Bae, Jun Born ^a   Rahman, M Dalil ^a   Kim, Woo Kyu ^a   McKenzie, Douglas ^a   Alemy, Eric L ^a   Ng, Waiman ^b   Padmanaban, Munirathna ^a  

^a CLARIANT CORPORATION   (United States)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

193 mn resists; CD SEM; Cycloolefinmaleic anhydride; Linewidth slimming; Methacrylate; Resist components

Indexed keywords

ALKENE DERIVATIVE; MALEIC ANHYDRIDE; METHACRYLIC ACID;

ARTICLE; CALCULATION; CHEMICAL REACTION; DEGRADATION; EVAPORATION; EXPOSURE; HEAT TREATMENT; MEASUREMENT; SCANNING ELECTRON MICROSCOPY;

EID: 0035755027     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.407     Document Type: Article

References (16)