Rigorous physical modeling of a materials-based frequency doubling lithography process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Robertson, Stewart A ^a   Biafore, John J ^a   Graves, Trey ^a   Smith, Mark D ^a  

^a KLA Tencor Austin   (United States)

Author keywords

Double patterning; Lithography simulation; Rigorous physical photoresist model

Indexed keywords

BOUNDARY VALUE PROBLEMS; DYNAMIC POSITIONING; EXPERIMENTS; FLOW INTERACTIONS; LITHOGRAPHY; OPTICAL PROPERTIES; PERCOLATION (SOLID STATE); REFRACTIVE INDEX;

32NM NODES; ALIGNMENT ERRORS; CHEMICAL INTERACTIONS; DOUBLE PATTERNING; DP METHODS; EXPERIMENTAL OBSERVATIONS; LITHOGRAPHY PROCESSES; LITHOGRAPHY SIMULATION; LOWER COSTS; MODELING STUDIES; NOVEL MATERIALS; OPTICAL EFFECTS; OPTICAL-; PATTERNING TECHNOLOGIES; PHYSICAL MODELING; PHYSICAL MODELS; POSITIVE RESISTS; PROCESS BEHAVIORS; RIGOROUS PHYSICAL PHOTORESIST MODEL; SIMULATION PREDICTIONS;

MODELS;

EID: 57349174494     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772736     Document Type: Conference Paper

References (13)

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