A lithographic and process assessment of photoresist stabilization for double-patterning using 172 nm photoresist curing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Bekiaris, Nikolaos ^a   Cervera, Hiram ^a   Dai, Junyan ^a   Kim, Ryoung Han ^b   Acheta, Alden ^c   Wallow, Thomas ^b   Kye, Jongwook ^b   Levinson, Harry J ^b   Nowak, Thomas ^d   Yu, James ^d  

^a Sokudo Co Ltd   (Japan)

^b ADVANCED MICRO DEVICES   (United States)

^c Submicron Development Center   (United States)

^d APPLIED MATERIALS INC   (United States)

Author keywords

172 nm cure; Double imaging; Double patterning; Photoresist pattern freezing; Resist stabilization

Indexed keywords

172 NM CURE; DOUBLE IMAGING; DOUBLE PATTERNING; PHOTORESIST PATTERN FREEZING; RESIST STABILIZATION;

CURING; LITHOGRAPHY; OPTIMIZATION; PHOTORESISTORS; STABILIZATION; STRUCTURAL OPTIMIZATION; SURFACE TREATMENT;

PHOTORESISTS;

EID: 51549097530     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.774205     Document Type: Conference Paper

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