OPC-free on-grid fine random hole pattern formation utilizing double resist patterning with double RETs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 3, 2007, Pages

  Nakao, Shuji ^a   Maejima, Shinroku ^a   Yamamoto, Takeshi ^a   Ono, Yoshiharu ^a   Sakai, Junjiro ^a   Yamaguchi, Atsumi ^a   Imai, Akira ^a   Hanawa, Tetsuro ^a   Sukoh, Kazuyuki ^a  

^a RENESAS TECHNOLOGY CORP   (Japan)

Author keywords

Double patterning; Double RETs; Hole pattern formation; On grid; OPC free; Positive tone resist

Indexed keywords

ARGON; ATTENUATION EQUALIZERS; HOLE CONCENTRATION; ION IMPLANTATION; LIGHTING; PHASE SHIFT; PHOTOLITHOGRAPHY; ROBUSTNESS (CONTROL SYSTEMS);

DENSE HOLE PATTERN; OPC FREE ON GRID; QUADRUPOLE ILLUMINATION; RESIST PROCESS;

PATTERN RECOGNITION;

EID: 35148829943     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711055     Document Type: Conference Paper

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