Double printing through the use of ion implantation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Samarakone, Nandasiri ^a   Yick, Paul ^a   Zawadzki, Mary ^b   Choi, Sang Jun ^b  

^a ASML US Inc   (United States)

^b SVTC Technologies   (United States)

Author keywords

Ion implantation; Line width roughness; Resist shrinkage; Resist stabilization

Indexed keywords

ARGON IONS; ION IMPLANTED; LINE WIDTH ROUGHNESS (LWR); LITHOGRAPHIC PROCESSING; OPTICAL MICRO LITHOGRAPHY; ORGANIC BARC; POTENTIAL BENEFITS;

ARGON; CHARGED PARTICLES; ELECTRONS; INERT GASES; ION BOMBARDMENT; ION IMPLANTATION; IONS; LIGHT WATER REACTORS; LITHOGRAPHY; MICROFLUIDICS; PLASMA ETCHING; PRINTING; SHRINKAGE;

ROUGHNESS MEASUREMENT;

EID: 45449107193     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.774051     Document Type: Conference Paper

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