Contact hole formation by multiple exposure technique in ultra-low k 1 lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 255-263

  Nakamura, Hiroko ^a   Onishi, Yasunobu ^a   Sato, Kazuya ^a   Tanaka, Satoshi ^a   Mimotogi, Shoji ^a   Hashimoto, Koji ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Contact hole; Low k1; Multiple exposure; Multiple resist layer patterning

Indexed keywords

ATTENUATION; COATING TECHNIQUES; COMPUTER SIMULATION; DIFFRACTIVE OPTICS; MASKS; OPTIMIZATION; PATTERN RECOGNITION; PHASE SHIFT; SCANNING ELECTRON MICROSCOPY;

CONTACT HOLE; LOW K1; MULTIPLE EXPOSURE; MULTIPLE RESIST LAYER PATTERNING;

PHOTOLITHOGRAPHY;

EID: 3843133940     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535114     Document Type: Conference Paper

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