Microstructure of Fe-N thin films prepared using an atomic nitrogen beam

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 2, 2001, Pages 405-409

  Telling, N D ^a   Jones, G A ^a   Faunce, C A ^a   Grundy, P J ^a   Blythe, H J ^b   Joyce, D E ^c  

^a UNIVERSITY OF SALFORD   (United Kingdom)

^b UNIVERSITY OF SHEFFIELD   (United Kingdom)

^c Oxford Applied Research   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC BEAMS; FILM GROWTH; FILM PREPARATION; IRON COMPOUNDS; METALLOGRAPHIC MICROSTRUCTURE; NITRIDES; NITROGEN; PHASE TRANSITIONS; VACUUM APPLICATIONS;

ATOMIC NITROGEN BEAMS;

MAGNETIC THIN FILMS;

EID: 0035271715     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1339016     Document Type: Article

References (12)