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Volumn 322, Issue 1, 2011, Pages 45-50

Hydrothermally grown ZnO buffer layer for the growth of highly (4 wt%) ga-doped ZnO epitaxial thin films on MgAl2O4 (1 1 1) substrates

Author keywords

A1. X ray diffraction; A2. Hydrothermal crystal growth; A2. Single crystal growth; B1. Oxide; B2. Semiconducting IIV materials

Indexed keywords

A2. SINGLE CRYSTAL GROWTH; AMMONIUM HYDROXIDE; AMMONIUM NITRATE; AQUEOUS SOLUTIONS; B1. OXIDE; BUFFERED SUBSTRATES; CRYSTALLINITIES; DEEP-LEVEL EMISSION PEAKS; DOPED ZNO; ELECTRICAL RESISTIVITY; EPITAXIAL THIN FILMS; GA-DOPED ZNO; HEXAGONAL WURTZITE; HYDROTHERMAL CRYSTAL GROWTH; HYDROTHERMAL TECHNIQUES; HYDROTHERMALLY; NEAR BAND EDGE EMISSIONS; OPTICAL AND ELECTRICAL PROPERTIES; ORIENTATION RELATIONSHIP; POLYCRYSTALLINE; RF MAGNETRON SPUTTERING TECHNIQUE; ROOM TEMPERATURE PHOTOLUMINESCENCE SPECTRA; SEMICONDUCTING II-V MATERIALS; ZINC NITRATES; ZNO; ZNO BUFFER LAYER;

EID: 79954583364     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2011.03.011     Document Type: Article
Times cited : (10)

References (39)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.