Effects of interface micro structure in crystallization of ZnO thin films prepared by radio frequency sputtering

Vacuum

Volumn 51, Issue 4, 1998, Pages 601-607

  Yoshino, Y ^a   Inoue, K ^a   Takeuchi, M ^a   Ohwada, K ^a  

^a MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS FILMS; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; GLASS; GOLD; INTERFACES (MATERIALS); MORPHOLOGY; SAPPHIRE; SPUTTERING; SUBSTRATES; THIN FILMS;

RADIO FREQUENCY SPUTTERING;

ZINC OXIDE;

EID: 0032318764     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00257-7     Document Type: Article

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