Dependence of the resistivity and the transmittance of sputter-deposited Ga-doped ZnO films on oxygen partial pressure and sputtering temperature

Journal of Materials Science

Volumn 42, Issue 13, 2007, Pages 4845-4849

  Kim, Sookjoo ^a   Lee, Wan In ^a   Lee, El Hang ^a   Hwang, S K ^a   Lee, Chongmu ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); GALLIUM COMPOUNDS; GRAIN BOUNDARIES; PARTIAL PRESSURE; SPUTTER DEPOSITION; THIN FILMS;

MINIMUM RESISTIVITY; OXYGEN VACANCY CONCENTRATION; SUBSTRATE TEMPERATURE;

ZINC OXIDE;

EID: 34547327568     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-006-0738-8     Document Type: Article

References (11)

1. Hartnagel HL, Dawar AL, Jain AK, Jagadish C (1995) Semiconduction transparent thin films. Institute of Physics Publishing, Bristol and Philadelphia
2. Mayer S, Chopra KL (1998) Solar Energy Mat 17:319
3. Wanka HA, Lotter E, Shubert MB (1994) Mat Res Soc Symp Proc 336:657
4. Hiramatsu M, Imaeda K, Horio N, Goto T (1998) J Vac Sci Technol A 16:669
5. Chen M, Pei ZL, Sun C, Gong J, Huang RF, Wen LS (2001) Mat Sei Eng 885:212
6. Minami T, Sato H, Nanto H, Takata S (1985) Jpn J Appl Phys 24:L781
7. Miyazaki M, Sato K, Mitsui A, Nishimura H (1997) J Non-Cryst Sol 218:323
8. Park KC, Ma DY, Kim KH (1997) Thin Solid Films 305:201
9. Chen M, Pei ZL, Sun C, Gong J, Hwang RF, Wen LS (2001) Mat Sei Eng B56:212
10. Lin Su-Shia, Huang Jow-Lay, Sajgalik t (2005) Surf Coat Technol 190:39
11. Yamamoto Y, Sakemi T, Awai K, Shirakata S (2004) Thin Solid Films 451-452:439