Effects of dopant (Al, Ga, and In) on the characteristics of ZnO thin films prepared by RF magnetron sputtering system

Current Applied Physics

Volumn 10, Issue SUPPL. 3, 2010, Pages

  Sim, Kyu Ung ^a   Shin, Seung Wook ^a   Moholkar, A V ^a,c   Yun, Jae Ho ^b   Moon, Jong Ha ^a   Kim, Jin Hyeok ^a  

^a Chonnam National University   (South Korea)

^b Korea Institute of Energy Research (KIER)   (South Korea)

^c Gopal Krishna Gokhale College   (India)

Author keywords

Dopant doped ZnO; Photoluminescence; RF magnetron sputtering; Transparent conducting oxide (TCO)

Indexed keywords

AFM IMAGE; BAND GAP ENERGY; COLUMNAR STRUCTURES; CONCENTRATION OF; DOPANT DOPED ZNO; DOPED SAMPLE; DOPED ZNO; DOPING ELEMENTS; ELECTRICAL PROPERTY; GLASS SUBSTRATES; HEXAGONAL WURTZITE; OUT-OF-PLANE ORIENTATION; PL SPECTRA; POLYCRYSTALLINE; RF-MAGNETRON SPUTTERING; SEM MICROGRAPHS; SURFACE SMOOTHNESS; TRANSPARENT CONDUCTING OXIDE; UV-VIS SPECTROMETER; VIOLET EMISSION; VISIBLE REGION; XRD STUDIES; ZINC VACANCY; ZNO THIN FILM;

CARRIER CONCENTRATION; CARRIER MOBILITY; DOPING (ADDITIVES); ELECTRIC PROPERTIES; GALLIUM; GALLIUM ALLOYS; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; ZINC; ZINC OXIDE; ZINC SULFIDE;

FILM PREPARATION;

EID: 77955517504     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.02.028     Document Type: Conference Paper

References (26)

1. C.C. Liu, Y.S. Chen, and J.J. Huang Electron. Lett. 42 14 2006 824
2. B. Asenjo, A.M. Chaparro, M.T. Gutiérrez, J. Herrero, and J. Klaer Thin Solid Films 515 15 2007 6036
3. I. Hamberg, and C.G. Granqvist J. Appl. Phys. 60 11 1986
4. T. Minami Semicond. Sci. Technol. 20 4 2005
5. Z.L. Pei, X.B. Zhang, G.P. Zhang, J. Gong, C. Sun, R.F. Huang, and L.S. Wen Thin Solid Films 497 1-2 2006 20
6. H.J. Ko, Y.F. Chen, S.K. Hong, H. Wenisch, T. Yao, and D.C. Look Appl. Phys. Lett. 77 23 2000 3761
7. C.S. Hong, H.H. Park, J. Moon, and H.H. Park Thin Solid Films 515 3 2006 957
8. S.J. Henley, M.N.R. Ashfold, and D. Cherns Surf. Coat. Technol. 177-178 2004 271
9. J.H. Lee, S.Y. Lee, and B.O. Park Mater. Sci. Eng. B 127 2-3 2006 267
10. J.H. Lee, and B.O. Park Thin Solid Films 426 1-2 2003 94
11. K.H. Kim, K.C. Park, and D.Y. Ma J. Appl. Phys. 81 12 1997 7764
12. R. Al Asmar, S. Juillaguet, M. Ramonda, A. Giani, P. Combette, A. Khoury, and A. Foucaran J. Cryst. Growth 275 3-4 2005 512
13. P.F. Lin, C.Y. Ko, W.T. Lin, and C.T. Lee Mater. Lett. 61 8-9 2007 1767
14. K. Shimakawa, and T. Itoh Jpn. J. Appl. Phys., Part 2: Lett. 46 20-24 2007
15. E. Burstein Phys. Rev. 93 3 1954 632
16. B. Lin, and Z. Fu Appl. Phys. Lett. 79 2001 943
17. A.V. Dijken, E.A. Meulenkamp, D. Vanmaekelbergh, and A. Meijerink J. Luminescence 87 2000 454
18. J.H. Kim, J.B. Lee, H.J. Kim, D.J. Kim, Y.E. Ihm, and W.K. Choo IEEE Trans. Magn. 38 2002 2880
19. S.H. Jeong, B.S. Kim, and B.T. Lee Appl. Phys. Lett. 82 2003 2625
20. E. de Posada, G. Tobin, E. McGlynn, and J.G. Lunney Appl. Surf. Sci. 208-209 2003 589
21. Z.F. Liu, F.K. Shan, J.Y. Sohn, S.C. Kim, G.Y. Kim, Y.X. Li, and Y.S. Yu J. Electroceram. 13 2004 183
22. Z. Potek, Z. Bryknar, P. Ptáek, and Z. Hubik Phys. Status Solidi (c) 2 2005 256
23. S. Zhao, Y. Zhou, K. Zhao, Z. Liu, P. Han, S. Wang, W. Xiang, Z. Chen, H. Lu, B. Cheng, and G. Yang Physica B 373 2006 154
24. K.B. Yim, and C.M. Lee Cryst. Res. Technol. 41 2006 1198
25. Z.W. Zhao, L.Z. Hu, H.Q. Zhang, J.C. Sun, J.M. Bian, K.T. Sun, X. Chen, J.Z. Zhao, X. Li, and J.X. Zhu Chin. Phys. Lett. 27 2010 017301
26. Z.K. Tang, G.K.L. Wong, P. Yu, M. Kawasaki, A. Ohtomo, H. Koinuma, and Y. Segawa Appl. Phys. Lett. 72 25 1998 3270