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Volumn 519, Issue 12, 2011, Pages 4025-4031

Synthesis of Al-Cr-O-N thin films in corundum and f.c.c. structure by reactive r.f. magnetron sputtering

Author keywords

Magnetron sputtering; Metastable phase; Oxynitride; Solid solution

Indexed keywords

ALUMINIUM OXIDE; CHEMICAL INERTNESS; COMBINATORIAL APPROACH; DEPOSITED COATINGS; ELEMENTAL COMPOSITIONS; HIGH HARDNESS; HIGH STRENGTH; HIGH TEMPERATURE STABILITY; IDENTICAL CONDITIONS; METAL CUTTING APPLICATIONS; METASTABLE PHASE; MODERATE TEMPERATURE; MULTIFUNCTIONAL PROPERTIES; NITROGEN GAS FLOW; OXYNITRIDES; PHASE ANALYSIS; POTENTIAL MATERIALS; PVD COATINGS; R.F. MAGNETRON SPUTTERING; THIN FILM MATERIAL;

EID: 79953721921     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.144     Document Type: Article
Times cited : (39)

References (66)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.