Combinatorial approach to the growth of α-(Al1-x,Crx)2O3 solid solution strengthened thin films by reactive r.f. magnetron sputtering

Surface and Coatings Technology

Volumn 204, Issue 20, 2010, Pages 3258-3264

  Diechle, D ^a   Stueber, M ^a   Leiste, H ^a   Ulrich, S ^a   Schier, V ^b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b Walter AG   (Germany)

Author keywords

Corundum; Escolaite; Magnetron sputtering; Metal oxide; Solid solution; Thermal stability

Indexed keywords

ALUMINIUM OXIDE; ARGON GAS; COMBINATORIAL APPROACH; DEGREE OF CRYSTALLINITY; ELEMENTAL COMPOSITIONS; ESCOLAITE; EXPERIMENTAL APPROACHES; GRAIN SIZE; LABORATORY SCALE; METAL OXIDE; MICROSTRUCTURE AND PROPERTIES; MICROSTRUCTURE EVOLUTIONS; NANOCRYSTALLINES; OXIDE THIN FILMS; PHYSICAL VAPOUR DEPOSITION; R.F. MAGNETRON SPUTTERING; STATIONARY CONDITIONS; SUBSTRATE BIAS; SUBSTRATE TEMPERATURE; TEM; THERMAL STABILITY; THIN FILM DENSITIES; TOTAL GAS PRESSURE; VICKERS MICROHARDNESS; X RAY REFLECTION;

ALUMINUM; ARGON; CHROMIUM; CORUNDUM; CRYSTALLIZATION; CUTTING TOOLS; DEPOSITION; ELECTRON PROBE MICROANALYSIS; GROWTH (MATERIALS); HEMATITE; MAGNETRON SPUTTERING; METALLIC COMPOUNDS; MICROSTRUCTURE; ORGANIC POLYMERS; OXIDE FILMS; OXYGEN; SCANNING ELECTRON MICROSCOPY; SOLID SOLUTIONS; SOLIDIFICATION; SUBSTRATES; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CHROMATE COATINGS;

EID: 77953025654     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.03.029     Document Type: Article

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