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Volumn 4, Issue 7, 2010, Pages 154-156

Ionized physical vapor deposited Al2O3 films: Does subplantation favor formation of α-Al2O3?

Author keywords

Al2O3; Alumina; Vapor deposition

Indexed keywords

AL2O3; CATHODIC ARC DISCHARGES; ENERGY DISTRIBUTIONS; GROWING FILMS; ION ENERGIES; ION SURFACE INTERACTIONS; MONOENERGETIC; MONTE CARLO; PHASE FORMATIONS; PHYSICAL VAPOR DEPOSITED; SUBPLANTATION; SUBSTRATE TEMPERATURE; THERMODYNAMICALLY STABLE;

EID: 77954822531     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201004133     Document Type: Article
Times cited : (37)

References (27)
  • 22
    • 77954820248 scopus 로고    scopus 로고
    • http//www.srim.org.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.