Influence of oxygen content on structure and properties of multi-element AlCrSiON oxynitride thin films

Surface and Coatings Technology

Volumn 204, Issue 16-17, 2010, Pages 2716-2722

  Karimi, A ^a   Morstein, M ^b   Cselle, T ^b  

^a EPFL   (Switzerland)

^b Platit AG   (Switzerland)

Author keywords

EPMA; Magnetron sputtering; Nanoindentation; Oxynitrides; SIMS; XRD

Indexed keywords

AL-CR-SI; AMORPHISATION; AMORPHOUS LAYER; CRYSTALLINITIES; EPMA; FILM HARDNESS; GAS FLOWS; GAS RATIO; GAS-FLOW RATIO; INFLUENCE OF OXYGEN; INTERSTITIAL ATOMS; METAL VACANCIES; MULTI-ELEMENT; NANO-INDENTATION MEASUREMENTS; NITRIDE PHASIS; OXIDE PHASIS; OXYGEN ATOM; OXYGEN FLOW; OXYGEN INCORPORATION; OXYNITRIDES; R.F. MAGNETRON SPUTTERING; SEM; STRUCTURE AND PROPERTIES; TARGET COMPOSITION; XRD;

AERODYNAMICS; ALUMINUM; AMORPHOUS FILMS; CHEMICAL ANALYSIS; CHROMIUM; ELECTRON PROBE MICROANALYSIS; FLOW OF GASES; NANOINDENTATION; NITRIDES; OXIDE FILMS; OXYGEN; SECONDARY ION MASS SPECTROMETRY; SILICON COMPOUNDS; X RAY DIFFRACTION;

OXYGEN VACANCIES;

EID: 77951297094     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.02.029     Document Type: Article

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