Mechanism of hardening in Cr-Al-N-O thin films prepared by pulsed laser deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 947-954

  Hirai, M ^a   Suzuki, T ^a   Suematsu, H ^a   Jiang, W ^a   Yatsui, K ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; COMPOSITION; ELASTIC MODULI; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDENING; NANOSTRUCTURED MATERIALS; PHASE TRANSITIONS; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SOLUBILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CHROMIUM ALUMINUM OXYNITRIDE; FOCUSED ION BEAM; GRAZING ANGLE X-RAY DIFFRACTOMETRY; SELECTED AREA DIFFRACTION;

THIN FILMS;

EID: 0041529702     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1578656     Document Type: Article

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