TEM investigation of alpha alumina films deposited at low temperature

Surface and Coatings Technology

Volumn 203, Issue 5-7, 2008, Pages 808-811

  Cloud, A N ^a   Canovic, S ^b   Abu Safe, H H ^a   Gordon, M H ^a   Halvarsson, M ^b  

^a UNIVERSITY OF ARKANSAS   (United States)

^b CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

Alpha alumina; Magnetron sputtering; Tool coating

Indexed keywords

ALUMINA; ALUMINUM COATED STEEL; CHROMIUM; DEPOSITION RATES; MAGNETRONS; MICROSCOPIC EXAMINATION; NICKEL OXIDE; OXIDE FILMS; STAINLESS STEEL; SUBSTRATES; THICK FILMS;

ALPHA ALUMINA; ALPHA ALUMINAS; ALPHA PHASE; ALUMINUM OXIDE THIN FILMS; CHROMIUM OXIDES; ENERGETIC SPECIES; INVERTED CYLINDRICAL MAGNETRONS; LOW TEMPERATURES; NICKEL COATED; SPUTTERING SYSTEMS; STEEL SUBSTRATES; TEM OBSERVATIONS; TEMPLATE LAYERS; TOOL COATING;

MAGNETRON SPUTTERING;

EID: 55749097420     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.05.034     Document Type: Article

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