The reactive magnetron deposition of CrNxOy films: First results of property investigations

Surface and Coatings Technology

Volumn 112, Issue 1-3, 1999, Pages 181-184

  Collard, St ^a   Kupfer, H ^a   Hecht, G ^a   Hoyer, W ^a   Moussaoui, H ^b  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF LIMOGES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; CRYSTAL ORIENTATION; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MICROHARDNESS; NITROGEN; OXYGEN; SPUTTER DEPOSITION; STRAIN; TEXTURES; TITANIUM NITRIDE; WEAR RESISTANCE;

CHROMIUM NITRIDE;

CERAMIC COATINGS;

EID: 0033076960     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00752-X     Document Type: Article

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