Chemical environment of iron atoms in iron oxynitride films synthesized by reactive magnetron sputtering

Scripta Materialia

Volumn 56, Issue 2, 2007, Pages 153-156

  Grafoute M ^a   Petitjean, C ^a   Rousselot, C ^a   Pierson, J F ^b   Greneche J M ^c  

^a UNIVERSITÉ DE FRANCHE COMTÉ   (France)

^b INSTITUT JEAN LAMOUR   (France)

^c UNIVERSITÉ DU MAINE   (France)

Author keywords

Iron oxynitride; M ssbauer spectrometry; Reactive sputtering; Thin film

Indexed keywords

BACKSCATTERING; IRON; MAGNETRON SPUTTERING; MOSSBAUER SPECTROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

IRON OXYNITRIDE; REACTIVE SPUTTERING; RUTHERFORD BACK-SCATTERING SPECTROMETRY;

METALLIC FILMS;

EID: 33750511523     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2006.09.012     Document Type: Article

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