Influence of oxygen content on structure and hardness of Cr-N-O thin films prepared by pulsed laser deposition

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2161-2166

  Suzuki, Tsuneo ^a   Inoue, Jun ^a   Saito, Hajime ^a   Hirai, Makoto ^a   Suematsu, Hisayuki ^a   Jiang, Weihua ^a   Yatsui, Kiyoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Chromium; Hardness; Laser ablation; Nitrides; Oxynitride; X ray diffraction

Indexed keywords

AMMONIA; CHROMIUM COMPOUNDS; CRYSTAL STRUCTURE; OXYGEN; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; VAPORS; X RAY DIFFRACTION ANALYSIS;

CR-N-O THIN FILMS; OXYGEN CONCENTRATION; OXYNITRIDE;

THIN FILMS;

EID: 33750797525     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.05.007     Document Type: Article

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