|
Volumn 203, Issue 5-7, 2008, Pages 661-665
|
Magnetron sputtering of hard Cr-Al-N-O thin films
|
Author keywords
Magnetron sputtering; Nanostructure; Oxynitride coatings
|
Indexed keywords
ALUMINUM;
CHROMIUM;
COATINGS;
DEPOSITION;
GROWTH (MATERIALS);
HARD COATINGS;
HARDNESS;
MAGNETRONS;
MATERIALS;
MATERIALS SCIENCE;
METALLIC COMPOUNDS;
METASTABLE PHASES;
MICROSTRUCTURE;
NANOCRYSTALLINE ALLOYS;
NANOCRYSTALLINE MATERIALS;
NANOSTRUCTURED MATERIALS;
NITRIDES;
SOLIDS;
SUBSTRATES;
THICK FILMS;
THIN FILMS;
BULK CERAMICS;
CHEMICAL COMPOSITIONS;
COMBINATORIAL MATERIALS SCIENCES;
DEPOSITION EXPERIMENTS;
GROWTH CONDITIONS;
HARD MATERIALS;
HIGH HARDNESSES;
IN DEPENDENCES;
MATERIALS RESEARCHES;
MICROSTRUCTURE EVOLUTIONS;
NANOCOMPOSITE THIN FILMS;
NANOCRYSTALLINE COATINGS;
NANOCRYSTALLINE THIN FILMS;
O THIN FILMS;
OXIDE PHASES;
OXYNITRIDE COATINGS;
PHASE FORMATIONS;
REACTIVE DEPOSITIONS;
SUBSTRATE BIASES;
SUBSTRATE TEMPERATURES;
SYNTHESIS OF;
VICKERS MICRO HARDNESSES;
WEAR RESISTANTS;
MAGNETRON SPUTTERING;
|
EID: 55749109047
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2008.04.083 Document Type: Article |
Times cited : (42)
|
References (17)
|