Surface roughening of polystyrene and poly(methyl methacrylate) in Ar/O2 plasma etching

Polymers

Volumn 2, Issue 4, 2010, Pages 649-663

  Ting, Yuk Hong ^a   Liu, Chi Chun ^a   Park, Sang Min ^a   Jiang, Hongquan ^b   Nealey, Paul F ^a   Wendt, Amy E ^a  

^a University of Wisconsin Madison   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

Cross linking; Diblock copolymer; Plasma etching; Polymer aggregation; Surface roughness

Indexed keywords

DATA SUPPORT; DIBLOCK COPOLYMER; HIGH RATE; ION BOMBARDMENT ENERGY; ION ENERGIES; LOW RATES; MASK-ROUGHNESS; NANOSCALE PATTERNING; PATTERN TRANSFERS; POLYMER AGGREGATION; POLYMER AGGREGATIONS; POLYMER MOLECULAR WEIGHT; RMS ROUGHNESS; SURFACE LAYERS; SURFACE-ROUGHENING;

AGGLOMERATION; BLOCK COPOLYMERS; COPOLYMERIZATION; DANGLING BONDS; ESTERS; ION BOMBARDMENT; IONS; LITHOGRAPHY; METAL ANALYSIS; MOLECULAR WEIGHT; PLASMA ETCHING; PLASMAS; POLYMERS; POLYSTYRENES; SURFACE PROPERTIES;

SURFACE ROUGHNESS;

EID: 79952837910     PISSN: None     EISSN: 20734360     Source Type: Journal    
DOI: 10.3390/polym2040649     Document Type: Article

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