SCOPUS 정보 검색 플랫폼

Volumn 50, Issue 5, 2004, Pages 589-592

Surface metallic state of aluminum-nitride (AlN) thin films prepared by direct current (DC)-reactive magnetron sputtering: Optical spectroscopic analysis with incoherent light

(3) Rakov, Nikifor a Mahmood, Arshad a Xiao, Mufei a,b

a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO (Mexico)

b CENTRO DE CIENCIAS DE LA MATERIA CONDENSADA (Mexico)

Author keywords

Aluminum nitride thin films; Direct current reactive magnetron sputtering; Incoherent light; Optical spectroscopy

Indexed keywords

ALUMINUM NITRIDE; DEPOSITION; DIELECTRIC FILMS; LIGHT SOURCES; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; SUBSTRATES;

OPTICAL SPECTROSCOPY; SURFACE METALLIC STATE;

SEMICONDUCTING FILMS;

EID: 0348234231 PISSN: 13596462 EISSN: None Source Type: Journal
DOI: 10.1016/j.scriptamat.2003.11.034 Document Type: Article

Times cited : (9)

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