Composition and mechanical properties of AlC, AlN and AlCN thin films obtained by r.f. magnetron sputtering

Surface and Coatings Technology

Volumn 203, Issue 13, 2009, Pages 1904-1907

  Yate, L ^a,c   Caicedo, J C ^a   Macias, A Hurtado ^b   Espinoza Beltran F J ^b   Zambrano, G ^a   Munoz Saldana J ^b   Prieto, P ^a  

^a UNIVERSIDAD DEL VALLE   (Colombia)

^b DEPARTAMENTO DE FÍSICA   (Mexico)

^c UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Aluminum carbide; Aluminum carbonitride; Aluminum nitride; Magnetron sputtering; Mechanical properties

Indexed keywords

ALUMINA; ALUMINUM NITRIDE; AMORPHOUS FILMS; ARGON; BIAS VOLTAGE; CARBIDES; CARBON NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; MAGNETRONS; MECHANICAL PROPERTIES; METALLIC FILMS; SEMICONDUCTING SILICON COMPOUNDS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

AL CONTENTS; ALN; ALUMINUM CARBIDE; ALUMINUM CARBONITRIDE; BERKOVICH HARDNESS; C-N FILMS; CO-SPUTTERING; ENERGY DISPERSIVE X-RAY SPECTROSCOPIES; FOURIER-TRANSFORMED INFRARED SPECTROSCOPIES; FTIR; NITROGEN CONTENTS; R.F. MAGNETRON SPUTTERING; REACTIVE MAGNETRON SPUTTERING; X-RAY DIFFRACTIONS; XRD;

ALUMINUM;

EID: 60949087259     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.01.023     Document Type: Article

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