Elaboration, characterization and dielectric properties study of amorphous alumina thin films deposited by r.f. magnetron sputtering

Vacuum

Volumn 62, Issue 1, 2001, Pages 27-38

  Segda, B G ^a   Jacquet, M ^b   Besse, J P ^b  

^a UNIVERSITÉ DE OUAGADOUGOU   (Burkina Faso)

^b CNRS   (France)

Author keywords

Alumina; Capacitors; Dielectric properties; r.f. magnetron; RBS; Sputtering; Thin films; XRF

Indexed keywords

AMORPHOUS FILMS; ARGON; DIELECTRIC PROPERTIES; MAGNETRON SPUTTERING; MAGNETRONS; OXIDES; VACUUM APPLICATIONS;

AMORPHOUS ALUMINA;

ALUMINA;

EID: 0035947203     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(01)00114-2     Document Type: Article

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