Transmission electron microscopy and X-ray diffraction analysis of alumina coating by alternate-current inverted magnetron-sputtering technique

Thin Solid Films

Volumn 516, Issue 2-4, 2007, Pages 397-401

  Aryasomayajula, A ^a   Canovic, S ^b   Bhat, D ^c   Gordon, M H ^a   Halvarsson, M ^b  

^a UNIVERSITY OF ARKANSAS   (United States)

^b CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^c NATIONAL SCIENCE FOUNDATION   (United States)

Author keywords

Alumina; Sputtering; TEM; XRD

Indexed keywords

ALUMINA; ELECTRON DIFFRACTION; MAGNETRON SPUTTERING; STAINLESS STEEL; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ALUMINA COATING; CHROMIUM OXIDE LAYER; PURE ALPHA ALUMINA;

COATINGS;

EID: 36049003646     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.002     Document Type: Article

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