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Volumn 127, Issue 2-3, 2000, Pages 203-218

Recent aspects concerning DC reactive magnetron sputtering of thin films: A review

Author keywords

Arcing; Hysteresis effect; Magnetron; Plasma emission monitoring; Pulsed magnetron; Reactive gas control; Reactive sputtering; Thin film; Voltage control

Indexed keywords

MAGNETIC HYSTERESIS; PLASMA APPLICATIONS; SPUTTER DEPOSITION; THIN FILMS; VOLTAGE CONTROL;

EID: 0033703601     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0257-8972(00)00566-1     Document Type: Article
Times cited : (464)

References (86)
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    • U.S. Patents 4,428,811 and 4,428,812.
  • 55
    • 0039792574 scopus 로고    scopus 로고
    • U.S. Patent 4,166,784, 1979, pp. 1-10
    • J. Chapin, C.R. Condon, U.S. Patent 4,166,784, 1979, pp. 1-10.
    • Chapin, J.1    Condon, C.R.2
  • 68
    • 0003899953 scopus 로고
    • Oxford, UK: Oxford University Press
    • Rosenberg H.M. The Solid State. 1984;Oxford University Press, Oxford, UK.
    • (1984) The Solid State
    • Rosenberg, H.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.