Structural, optical and mechanical properties of aluminium nitride films prepared by reactive DC magnetron sputtering

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 235-239

  Venkataraj, S ^a   Severin, D ^a   Drese, R ^a   Koerfer, F ^a   Wuttig, M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Aluminium nitride; Optical properties; Sputtering; Stress; X ray reflectometry

Indexed keywords

ALUMINUM NITRIDE; ENERGY GAP; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR MATERIALS; STOICHIOMETRY; X RAY DIFFRACTION;

GLASS SUBSTRATES; WAFER CURVATURE MEASUREMENTS; X-RAY REFLECTOMETRY;

THIN FILMS;

EID: 33344460663     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.281     Document Type: Conference Paper

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