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Journal of Applied Physics

Volumn 108, Issue 3, 2010, Pages

Spectral analysis of line edge and line-width roughness with long-range correlation

(2) Hiraiwa, Atsushi a,b Nishida, Akio a

a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

b RENESAS TECHNOLOGY CORP (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTIC FORMULA; CONVENTIONAL METHODS; CORRELATION LENGTHS; GATHERING LINES; LARGE SCALE INTEGRATION; LINE EDGE ROUGHNESS; LINEWIDTH ROUGHNESS; LONG LINE; LONG RANGE CORRELATIONS; OSCILLATORY STRUCTURE; POWER SPECTRAL DENSITY METHOD; RESEARCH AND DEVELOPMENT; SPECTRAL ANALYSIS; STATISTICAL NOISE; STOCHASTIC PROCESS; TOTAL VARIANCE; UPPER LIMITS; WAVE NUMBERS;

CORRELATION METHODS; FOURIER TRANSFORMS; PHOTORESISTS; POWER SPECTRAL DENSITY; RANDOM PROCESSES; SOIL STRUCTURE INTERACTIONS; SPECTRUM ANALYSIS; SPECTRUM ANALYZERS;

ROUGHNESS MEASUREMENT;

EID: 77955878776 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3466777 Document Type: Article

Times cited : (27)

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