Influence of image processing on line-edge roughness in CD-SEM measurement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6922, Issue , 2008, Pages

  Yamaguchi, Atsuko ^a   Yamamoto, Jiro ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSOLUTE MEASUREMENTS; CONVENTIONAL METHODS; EVALUATION ALGORITHM; LINE EDGE ROUGHNESS; SCANNING ELECTRON MICROSCOPES; SIGNAL INTENSITIES;

IMAGE PROCESSING; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; UNITS OF MEASUREMENT;

ROUGHNESS MEASUREMENT;

EID: 66649105936     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.775664     Document Type: Conference Paper

References (5)

1. B. D. Bunday, M. Bishop, D. McCormack, J. S. Villarrubia, A. E. Vladar, R. Dixon, T. Vorburger, and N. G. Orji, "Determination of optimal parameters for CD-SEM measurement of line-edge roughness", Proc. SPIE, vol. 5375, 515(2004).
2. J. S. Villarrubia and B. D. Bunday, "Unbiased estimation of linewidth roughness", Proc. SPIE, vol. 5752, 480(2005).
3. R. Katz, C. D. Chase, R. Kris, R. Peltinov, J. Villarrubia and B. Bunday, "Bias Reduction in Roughness Measurement Through SEM Noise Removal", Proc. SPIE, vol. 6152, 61524L (2006).
4. A. Yamaguchi, K. Ichinose, S. Shimamoto, H. Fukuda, R. Tsuchiya, K. Ohnishi, H. Kawada, and T. Iizumi, "Metrology of LER: influence of line-edge roughness (LER) on transistor performance", Proc. SPIE vol. 5375, 468(2004).
5. http://www.itrs.net/Links/2006Update/2006UpdateFinal.htm.