Impact of long-period line-edge roughness (LER) on accuracy in critical dimension (CD) measurement and new guideline for CD metrology

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5575-5580

  Yamaguchi, Atsuko ^a   Fukuda, Hiroshi ^a   Kawada, Hiroki ^b   Iizumi, Takashi ^b  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

CD variation; CD SEM; Critical dimension; Line edge roughness; Linewidth roughness; Repeatability

Indexed keywords

MEASUREMENTS; SCANNING ELECTRON MICROSCOPY;

CD VARIATION; CD-SEM; CRITICAL DIMENSION; LINE-EDGE ROUGHNESS; LINEWIDTH ROUGHNESS; REPEATABILITY;

SURFACE ROUGHNESS;

EID: 31844437721     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5575     Document Type: Article

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