Investigation of antiadhesive coatings for nanoimprinting lithography

Materials and Manufacturing Processes

Volumn 25, Issue 7, 2010, Pages 658-664

  Zhong, Z W ^a   Shan, X C ^b   Yao, Y C ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

Antiadhesive coating; Contact angle; Micro and nanoscale patterns; Nanoimprinting lithography

Indexed keywords

ANTI-ADHESIVE; ANTIADHESIVE COATING; ATOMIC FORCE MICROSCOPES; COATED SURFACE; COATING PARAMETERS; COATING PROCESS; COATING TIME; DIFFERENT PROCESS; IMPRINTING PROCESS; INTERFACIAL FORCES; MOLD SURFACES; NANO-IMPRINTING; NANO-IMPRINTING PROCESS; NANO-SCALE PATTERNS; NANOIMPRINTING LITHOGRAPHY; OPTIMUM PARAMETERS; SOLUTION CONCENTRATION; SURFACE CONTACT ANGLE;

ANGLE MEASUREMENT; CONTACT ANGLE; DEIONIZED WATER; LITHOGRAPHY; MOLDS; NANOSTRUCTURED MATERIALS;

COATINGS;

EID: 77955438756     PISSN: 10426914     EISSN: 15322475     Source Type: Journal    
DOI: 10.1080/10426910903496888     Document Type: Article

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