Nano-scale patterning using the roll typed UV-nanoimprint lithography tool

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 861-865

  Lee, JaeJong ^a   Park, SooYeon ^a   Choi, KeeBong ^a   Kim, GeeHong ^a  

^a Korea Institute of Machine and Materials   (South Korea)

Author keywords

Flexible stamp; Roll typed UV NIL; Stamp replication; Thermal nanoimprint

Indexed keywords

COST EFFECTIVENESS; POLYCARBONATES; SILICON WAFERS; ULTRAVIOLET RADIATION;

FLEXIBLE STAMP; STAMP REPLICATION; THERMAL NANOIMPRINT;

NANOIMPRINT LITHOGRAPHY;

COST EFFECTIVENESS; LITHOGRAPHY; POLYCARBONATES; ULTRAVIOLET RADIATION;

EID: 44149095772     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.059     Document Type: Article

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