Fabrication of 70 nm narrow metal nanowire structure on flexible PET film by nanoimprint lithography

Microelectronic Engineering

Volumn 85, Issue 4, 2008, Pages 710-713

  Lee, Jong Hwa ^a   Yang, Ki yeon ^a   Hong, Sung Hoon ^a   Lee, Heon ^a   Choi, Kyung Woo ^b  

^a Korea University   (South Korea)

^b Korea Institute of Nuclear Safety (KINS)   (South Korea)

Author keywords

Lift off; Metal nanowire; Nanoimprint; Partial filling effect; PET film; PMMA

Indexed keywords

NANOIMPRINT LITHOGRAPHY; POLYETHYLENE TEREPHTHALATES; POLYMER FILMS; POLYMETHYL METHACRYLATES; SUBSTRATES;

METAL NANOWIRES; PARTIAL FILLING EFFECT; PARTIAL FILLING EFFECTS; RESIST PATTERNS;

NANOWIRES;

LITHOGRAPHY; POLYETHYLENE TEREPHTHALATE; SUBSTRATES;

EID: 40249089780     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.058     Document Type: Article

References (17)

1. Ji Y., Francl J., Fritz W.J., Bos P.J., and West J.L. SID Dig. 96 (1996) 611
2. Blanchet G.B., Loo Y.L., Fogers J.A., Gao F., and Fincher C.R. Appl. Phys. Lett. 82 (2003) 463
3. Lee H., Hong S.H., Yang K.Y., and Choi K.W. Appl. Phys. Lett. 88 (2006) 143112
4. Chen L., Wang J.J., Walters F.W., Deng X., Buonanno M., Tai S., and Liu X. Appl. Phys. Lett. 90 (2007) 063111
5. Wang J.J., Walters F., Liu X., Sciortino P., and Deng X. Appl. Phys. Lett. 90 (2007) 061104
6. Ekinci Y., Solak H.H., David C., and Sigg H. Opt. Express 14 (2006) 2323
7. Chou S.Y., Krauss P.R., and Renstrom P.J. Appl. Phys. Lett. 67 (1995) 3114
8. Lee H., and Jung G.Y. Microelectronic Eng. 77 (2005) 42
9. Lim M., Wang J., Zhuang L., and Chou S.Y. Appl. Phys. Lett. 76 (2000) 673
10. Austin M.D., and Chou S.Y. Appl. Phys. Lett. 81 (2002) 4431
11. Moritz J., Dieny B., Nozieres J.P., Landis S., Lebib A., and Chen Y.J. Appl. Phys. Lett. 91 (2002) 7314
12. Pfeiffer K., Bleidiessel G., Gruetzner G., Schulz H., Hoffmann T., Scheer H.C., Sotomayor Torres C.M., and Ahopelto J. Microelectron. Eng. 46 (1999) 431
13. Pfeiffer K., Reuther F., Fink M., Gruetzner G., Carlberg P., Maximov I., Montelius L., Seekamp J., Zankovych S., Sotomayor Torres C.M., Schulz H., and Scheer H.C. Microelectron. Eng. 67-68 (2003) 266
14. Gonsalves K.E., Merhari L., Wu H., and Hu Y. Adv. Mater. 13 (2001) 703
15. Liao W.C., Hwu S.L.C., and Lin J.C. Microelecton. Eng. 84 (2007) 129
16. Jung G.Y., Ganapathiappan S., Li X., Ohlberg D.A.A., Olynick D.L., Chen Y., Tong W.M., and Williams R.S. Appl. Phys. A 78 (2004) 1169
17. K.Y.Yang, J.W. Kim, K.J. Byeon, H. Lee, Presented at the Developments in Materials, Processes and Applications for Nanotechnology, Ulster Belfast University, UK, 2007 (unpublished).