Metal direct nanoimprinting for photonics

Microelectronic Engineering

Volumn 85, Issue 2, 2008, Pages 419-424

  Buzzi, Stefano ^a   Robin, Franck ^a   Callegari, Victor ^a,b   Löffler, Jörg F ^a  

^a ETH ZURICH   (Switzerland)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Coining; Metamaterials; Microforging; Microforming; Nano printing; Nanoimprint lithography

Indexed keywords

ABSORPTION; ASPECT RATIO; CRYSTALLOGRAPHY; DIELECTRIC MATERIALS; GOLD; METAL WORKING; METALS; NANOTECHNOLOGY; NITRIDES; NONMETALS; OPTICAL DESIGN; OPTICAL DEVICES; OPTICAL INSTRUMENTS; OPTICAL WAVEGUIDES; PHOTONIC CRYSTALS; PHOTONICS; SILICA; SILICON COMPOUNDS; SILICON NITRIDE; SILVER; STANDARDS;

CHIRAL STRUCTURES; ELEVATED TEMPERATURES; INFRARED (IR); LATERAL DIMENSIONS; MICRO-PARTS; NANO-IMPRINTING; NEAR INFRA-RED (NIR); OPTICAL (PET) (OPET); PHOTONIC; PLASMON WAVEGUIDES; SHAPED HOLES; SILICON OXIDES; TELECOM WAVELENGTHS; VISIBLE RANGE;

SILICON WAFERS;

EID: 41549095181     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.08.001     Document Type: Article

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