A new UV lithography photoresist based on composite of EPON resins 165 and 154 for fabrication of high-aspect-ratio microstructures

Sensors and Actuators, A: Physical

Volumn 135, Issue 2, 2007, Pages 625-636

  Yang, Ren ^a   Soper, Steven A ^a   Wang, Wanjun ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

EPON resin 165; EPON resins 154; Negative tune resist; Polymer microstructures; SU 8; Thick photoresist; Ultra high aspect ratio

Indexed keywords

ASPECT RATIO; LITHOGRAPHY; MEMS; MICROSTRUCTURE; PHOTORESISTORS; SOLVENTS; ULTRAVIOLET DEVICES;

EPON RESIN; NEGATIVE TUNE RESIST; POLYMER MICROSTRUCTURES; THICK PHOTORESIST; ULTRA HIGH ASPECT RATIO;

RESINS;

EID: 34047178592     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2006.09.009     Document Type: Article

References (42)

1. Lorenz H., Despont M., Fahrni N., LaBianca N., Vettiger P., and Renaud P. EPON SU-8: a low-cost negative resist for MEMS. Proceedings of Micro Mechanics Europe. Barcelona (1996)
2. Lorenz H., Despont M., Fahrni N., LaBianca N., Renaud P., and Vettiger P. SU-8: a low-cost negative resist for MEMS. J. Micromech. Microeng. 7 3 (1997) 121-124
3. Lorenz H., Despont M., Vettiger P., and Renaud P. Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist. Microsyst. Technol. 4 (1998) 143-146
4. Ling Z., Lian K., and Jian L. Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters. Proceeding of SPIE (2000)
5. Zhang J., Tan K.L., Hong G.D., Yang L.J., and Gong H.Q. Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS. J. Micromech. Microeng. 11 1 (2001) 20-26
6. Ghantasala M.K., Hayes J.P., Harvey E.C., and Sood D.K. Patterning, electroplating and removal of SU-8 moulds by excimer laser micromachining. J. Micromech. Microeng. 11 2 (2001) 133-139
7. Borreman A., Musa S., Kok A., Diemeer M., and Driessen A. Fabrication of polymeric multimode waveguides and devices in SU-8 photoresist using selective polymerization. Proceedings Symposium IEEE/LEOS Benelux Chapter. Amsterdam (2002)
8. Lin C., Lee G.B., Chang B., and Chang G. A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist. J. Micromech. Microeng. 12 5 (2002) 590-597
9. Ho H.C., Chin K.P., Yang C.R., Wu H.-M., and Chen S.-L. Ultrathick SU-8 mold formation and removal, and its application to the fabrication of LIGA-like micromotors with embedded roots. Sens. Actuators A: Phys. 102 1-2 (2002) 130-138
10. Dentinger M.P., Clift W.M., and Goods S.H. Removal of SU-8 photoresist for thick film applications. Microelectron. Eng. 61-62 (2002) 993-1000
11. Williams J.D., and Wang W. UV Lithgragphy process for ultra high aspect ratio SU-8 microstructures with and without megasonic development. High Aspect Ratio Micro-Structure Technology Workshop (HARMST2003). Monterey, California, USA (2003)
12. Rabarot M., Bablet J., Ruty M., Kipp M., Chartier I., and Dubarry C. Thick SU-8 photolithography for bioMEMS. Proceedings of SPIE, The International Society for Optical Engineering (2003)
13. Lee S.J., Shi W., Maciel P., and Cha S.W. Top-edge profile control for SU-8 structural photoresist. Proceedings of 15th Biennial University/Government/Industry Microelectronics Symposium. Boise, ID, USA (2003)
14. Choi Y., Powers R., Vernekar V., Frazier A.B., LaPlaca M.C., and Allen M.G. High aspect ratio SU-8 structures for 3-D culturing of neurons. American Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS) (2003)
15. Sato H., Houshi Y., Otsuka T., and Shoji S. Fabrication of the 3-D SU-8 fine micromesh and electroplated Ni micromesh structures. Digest of Papers, Microprocesses and Nanotechnology (2004)
16. Williams J.D., and Wang W. Using megasonic development of SU-8 to yield ultra-high aspect ratio microstructures with UV lithography. Microsyst. Technol. 10 9 (2004) 694-698
17. Kim K., Park S.D., Lu M.H., Che W., Kim K., Lee J.-B., and Ahn C.H. A tapered hollow metallic microneedle array using backside exposure of SU-8. J. Micromech. Microeng. 14 4 (2004) 593-603
18. Yang R., and Wang W. Out-of-plane polymer refractive microlens fabricated based on direct lithography of SU-8. Sens. Actuators A: Phys. 113 1 (2004) 71-77
19. Reznikova E.F., Mohr J., and Hein H. Deep photo-lithography characterization of SU-8 resist. Microsyst. Technol. 11 4-5 (2005) 282-291
20. Yang R., Feeback D.L., and Wang W. Microfabrication and test of three-dimensional polymer hydro-focusing unit for flow cytometry applications. Sens. Actuators A: Phys. 118 2 (2005) 259-267
21. Yang R., Soper S.A., and Wang W. Out-of-plane microlens array fabricated using ultraviolet lithography. Appl. Phys. Lett. 86 16 (2005) 161110
22. Dai W., Lian K., and Wang W. A quantitative study on the adhesion property of cured SU-8 on various metallic surfaces. Microsyst. Technol. 11 7 (2005) 526-534
23. Yang R., Soper S.A., and Wang W. Microfabrication of pre-aligned fiber bundle couplers using ultraviolet lithography of SU-8. Sens. Actuators A: Phys. 127 1 (2006) 123-130
24. http://www.resins.com/resins/am/products/Epon.html
25. Chuang Y.-J., Tseng F.-G., and Lin W.-K. Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination. Microsyst. Technol. 8 (2002) 308-313
26. Yang R., and Wang W. Application of optical refractive index liquid and wavelength selection for ultra-hight-aspect-ratio UV-lithography of thick SU-8 resist. Sens. Actuator B: Chem. 110 2 (2005) 279-288
27. Yang R., and Wang W. Numerical and experimental study on an out-of-plane pre-aligned refractive microlens fabricated using UV lithography method. Opt. Eng. 43 12 (2004) 3096-3103
28. Yang R., and Wang W. Fabrication of out-of-plane SU-8 refractive microlens using directly lithography method. Proceedings of SPIE. San Jose, CA (2004)
29. Yang R., Jeong S.J., and Wang W. UV-LIGA microfabrication of a power relay based on electrostatic actuation. Proceedings of SPIE Symposium on Micromachining and Microfabrication, MEMS Components and Applications for Industry, Automobiles, Aerospace, and Communication II (2003)
30. Yang R., Soper S.A., and Wang W. Fabrication of out-of-plane concave and convex refractive microlens array. Proceedings of SPIE (2005)
31. Yang R., Chan K.F., Feng Z., Akihito I., and Mei W. Design and fabrication of microlens and spatial filter array by self-alignment for maskless lithography systems. J. Microlithogr. Microfabrication Microsyst. 2 3 (2003) 210-219
32. Yang R., Jiang J., Meng W.J., and Wang W. Numerical simulation and fabrication of microscale, multilevel, tapered mold inserts using UV-Lithographie, Galvanoformung, Abformung (LIGA) technology. Microsyst. Technol. 12 6 (2006) 545-553
33. Yang R., Williams J.D., and Wang W. A Rapid micro-mixer/reactor based on arrays of spatially impinging micro-jets. J. Micromech. Microeng. 14 10 (2004) 1345-1351
34. Williams J.D., and Wang W. Study on the postbaking process and the effects on UV lithography of high aspect ratio SU-8 microstructures. J. Microlithogr. Microfabrication Microsyst. 3 4 (2004) 563-568
35. Williams J.D., and Wang W. Micro fabrication of an electromagnetic power micro-relay using SU-8 based UV-LIGA technology. High Aspect Ratio Micro-Structure Technology Workshop (HARMST 2003). Monterey, California, USA (2003)
36. Williams J.D., Yang R., and Wang W. Numerical simulation and dynamic test of UV-LIGA fabricated electromagnetic micro-relay for power applications. Sens. Actuators A: Phys. 120 1 (2005) 154-162
37. O'Bren J., Hughes P.J., Brunent M., O'Neil B., Alderman J., Lane B., O'Riordan A., and O'Driscoll C. Advanced photoresist technologies for microsystems. J. Micromech. Microeng. 11 4 (2001) 351-358
38. LaBianca N., Gelorme J., Lee K., Sullivan E., and Shaw J. High aspect ratio optical resist chemistry for MEMS applications. Proceedings of Fourth International Symposium on Magnetic Materials, Processes, and Devices (1995)
39. Lorenz H., Despont M., Fahrni N., Brugger J., Renaud P., and Vettiger P. High aspect ratio ultrathick, negative-tone near-UV photoresist and its applications for MEMS. Sens. Actuators A: Phys. 64 (1998) 33-39
40. Yoon Y.-K., Park J.H., Cros F., and Allen M.G. Integrated vertical screen microfilter system using inclined SU-8 structures. Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS) (2003)
41. Lee G.B., Lin C.H., and Chang G.-L. Micro flow cytometers with buried SU-8/SOG optical waveguides. Sens. Actuators A: Phys. 103 1-2 (2002) 165-170
42. El-Ali J., Perch-Nielsen I.R., Poulsen C.R., Bang D.D., Telleman P., and Wolff A. Simulation and experimental validation of a SU-8 based PCR thermocycler chip with integrated heaters and temperature sensor. Sens. Actuators A: Phys. 110 1-3 (2004) 3-10