Anti-adhesive effects of diverse self-assembled monolayers in nanoimprint lithography

Sensors and Actuators, A: Physical

Volumn 139, Issue 1-2 SPEC. ISS., 2007, Pages 145-151

  Wu, Chih Wei ^a   Shen, Yung Kang ^b   Chuang, Sheng Yu ^a   Wei, C S ^c  

^a NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^b LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Anti adhesive; Nanoimprint; Self assembled monolayer

Indexed keywords

ADHESIVES; MOLDS; NANOIMPRINT LITHOGRAPHY; NANOSTRUCTURES; TOLUENE;

ANTI-ADHESIVE; IMPRINT CYCLES; POLYMER RESIDUE;

SELF ASSEMBLED MONOLAYERS;

ADHESIVES; LITHOGRAPHY; MOLDS; MONOLAYERS; TOLUENE;

EID: 34548172029     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2006.10.017     Document Type: Article

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