Applying the one-column, many pencil local scanning maskless lithography technology to micro-RP system

International Journal of Advanced Manufacturing Technology

Volumn 41, Issue 7-8, 2009, Pages 727-733

  Wang, Jia Chang ^a   Hsieh, Ming Zhe ^a  

^a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Maskless lithography; Rapid prototyping; Spray coating

Indexed keywords

CONCURRENT ENGINEERING; JOB ANALYSIS; MIRRORS; OPTICAL SYSTEMS; PINCH EFFECT; PIXELS; RAPID PROTOTYPING; RESINS; SCANNING; TECHNOLOGY; THREE DIMENSIONAL;

DIGITAL LIGHT PROCESSING; DIGITAL MIRROR DEVICES; DYNAMIC MASKS; HIGHER RESOLUTIONS; LIGHT BEAMS; MASKLESS LITHOGRAPHY; MICRO MIRRORS; RAPID PROTOTYPING SYSTEMS; SPRAY COATING; ZOOM LENS;

LITHOGRAPHY;

EID: 62349122219     PISSN: 02683768     EISSN: 14333015     Source Type: Journal    
DOI: 10.1007/s00170-008-1515-4     Document Type: Article

References (7)

1. Hornbeck LJ (1996) Digital light processing: A new MEMS-based display, 4th Sensor Symp, p 297-304
2. A Bertsch P Bernhard C Vogt PB Renaud 2000 Rapid prototyping of small size objects Rapid Prototyping Journal 6 4 259 266
3. M Klosner K Jain 2004 Massively parallel, large-area maskless lithography Appl Phys Lett 84 2880 2882
4. JD Richardson 1999 Characterisation of epoxy resins for microstereolithographic rapid prototyping Int J Adv Manuf Technol 15 281 286
5. Menon R, Patel A, Moon EE, Smith HI (2004) Alpha-prototype system for zone-plate-array lithography. American Vacuum Society,DOI 10.1116/1.1813464
6. K Renap JP Kruth 1995 Recoating issues in stereolithography Rapid Prototyping J 1 3 4 16
7. SJ Huang WC Shen 2005 Development of a multi-optical source rapid prototyping system Int J Adv Manuf Technol 27 63 69 doi:10.1007/s00170-004-2151- 2