Fabrication of carbon nanotube arrays for field emission and sensor devices by nanoimprint lithography

Microelectronics Journal

Volumn 40, Issue 3, 2009, Pages 604-607

  Yin, Lei ^a   Liu, Hongzhong ^a   Ding, Yucheng ^a   Lan, Hongbo ^a   Lu, Bingheng ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Carbon nanotube arrays; Nanoimprint lithography; Residual resist; UV curing

Indexed keywords

CURING; FIELD EMISSION; INDUCTIVELY COUPLED PLASMA; NANOIMPRINT LITHOGRAPHY; OXIDE MINERALS; PHOTORESISTS; QUARTZ; SENSORS; SILICONES; SUBSTRATES;

CARBON NANOTUBE ARRAYS; CONDUCTIVE SUBSTRATES; FABRICATING PROCESS; IMPRINTING PROCESS; IRON PHTHALOCYANINES; NANO-IMPRINT LITHOGRAPHIES; ORGANIC SOLUTIONS; PATTERNED SUBSTRATES; POLYDIMETHYLSILOXANE STAMPS; RESIDUAL RESIST; RESIST PATTERNS; SENSOR DEVICES; SPACE BETWEEN; TURN-ON FIELDS; ULTRASONIC VIBRATIONS; ULTRAVIOLET CURING; UV CURING; UV EXPOSURE PROCESS;

CARBON NANOTUBES;

EID: 61349189572     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2008.06.031     Document Type: Article

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