Impact of solution agglomeration on the deposition of self-assembled monolayers

Langmuir

Volumn 16, Issue 20, 2000, Pages 7742-7751

  Bunker, B C ^a   Carpick, R W ^a,b   Assink, R A ^a   Thomas, M L ^a   Hankins, M G ^a   Voigt, J A ^a   Sipola, D ^a   De Boer, M P ^a   Gulley, G L ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGENTS; AGGLOMERATION; CONDENSATION REACTIONS; DEPOSITION; HYDROLYSIS; MICELLES; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; ORGANIC COMPOUNDS; REACTION KINETICS; SOLUTIONS; SUBSTRATES; SURFACES;

INVERSE MICELLE FORMATION; ISOOCTANE; PERFLUORODECYLTRICHLOROSILANE; SELF ASSEMBLED MONOLAYERS; SOLUTION AGGLOMERATION; TRICHLOROSILANE COUPLING AGENTS;

MONOLAYERS;

EID: 0034299199     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la000502q     Document Type: Article

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