The effects of O2/Ar ratio on the structure and properties of hafnium dioxide (HfO2) films

Vacuum

Volumn 81, Issue 3, 2006, Pages 211-214

  He, Zhibing ^a   Wu, Weidong ^a   Xu, Hua ^a   Zhang, Jicheng ^a   Tang, Yongjian ^a  

^a RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

HfO2 film; Reactive dc magnetron sputtering

Indexed keywords

ARGON; BINDING ENERGY; HAFNIUM COMPOUNDS; MAGNETRON SPUTTERING; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

HFO2 FILM; REACTIVE DC MAGNETRON SPUTTERING;

AMORPHOUS FILMS;

EID: 33749076649     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.02.003     Document Type: Note

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