High-pressure reactively sputtered Hf O2: Composition, morphology, and optical properties

Journal of Applied Physics

Volumn 102, Issue 4, 2007, Pages

  Toledano Luque, M ^a   San Andrs E ^a   Del Prado, A ^a   Martil I ^a   Lucia M L ^a   Gonzalez Diaz G ^a   Martinez F L ^b   Bohne, W ^c   Rohrich J ^c   Strub, E ^c  

^a UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

^b TECHNICAL UNIVERSITY OF CARTAGENA   (Spain)

^c HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; GROWTH RATE; METALLIC FILMS; MORPHOLOGY; OPTICAL PROPERTIES; SPUTTERING; X RAY DIFFRACTION;

ABSORPTION COEFFICIENT; HAFNIUM OXIDE FILMS; POLYCRYSTALLINE STRUCTURE;

HAFNIUM COMPOUNDS;

EID: 34548421962     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2769959     Document Type: Article

References (37)

1. J. Robertson, Rep. Prog. Phys. 69, 327 (2006).
2. S. H. Oh, Digest of Technical Papers of the 2003 Symposium on VLSI Technology, 2003 (unpublished), pp. 73-74.
3. M. Lesser, Opt. Eng. 26, 911 (1987).
4. M. Fadel, O. A. Azim, O. A. Omer, and R. R. Basily, Appl. Phys. A: Mater. Sci. Process. 66, 335 (1998).
5. C. Moldovan, R. Iosub, M. Modreanu, D. Ulieru, B. Firtat, and M. Ion, International Semiconductor Conference 2006 (unpublished), pp. 185-188.
6. T. Wang, C. Chang, and J. G. Hwu, IEEE Sens. J. 6, 1468 (2006).
7. F. Wallrapp and P. Fromherz, J. Appl. Phys. 99, 114103 (2006).
8. H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, Thin Solid Films 447-448, 509 (2004).
9. U. Poppe, J. Appl. Phys. 71, 5572 (1992).
10. B. Chapman, Glow Discharge Processes (Wiley, New York, 1980).
11. M. A. Navacerrada, M. L. Lucía, and F. Sánchez-Quesada, Phys. Rev. B 61, 6422 (2000).
12. E. San Andŕs, J. Vac. Sci. Technol. A 23, 1523 (2005).
13. M. I. Faley, S. B. Mi, A. Petraru, C. L. Jia, U. Poppe, and K. Urban, Appl. Phys. Lett. 89, 082507 (2006).
14. F. L. Martínez, M. Toledano, E. San Andŕs, I. Mártil, G. González-Díaz, W. Bohne, J. Röhrich, and E. Strub, Thin Solid Films 515, 695 (2006).
15. W. Kern, RCA Rev. 31, 187 (1970).
16. W. Bohne, J. Röhrich, and G. Röschert, Nucl. Instrum. Methods Phys. Res. B 136-138, 633 (1998).
17. W. Bohne, S. Hessler, and G. Röschert, Nucl. Instrum. Methods Phys. Res. B 113, 78 (1996).
18. W. Bohne, W. Fuhs, J. Röhrich, B. Selle, G. González- Díaz, I. Mártil, F. L. Martínez, and A. del Prado, Surf. Interface Anal. 30, 534 (2000).
19. J. L. Hernández-Rojas, M. L. Lucía, I. Mártil, G. González-Díaz, J. Santamaría, and F. Sánchez- Quesada, Appl. Opt. 31, 1606 (1992).
20. J. Tauc, R. Grigorovici, and A. Vancu, Phys. Status Solidi 15, 627 (1966).
21. B. D. Cullity, Elements of X-ray Diffraction 2nd ed. (Addison-Wesley, Reading, MA, 1978).
22. E. H. Nicollian and J. R. Brews, MOS Physics and Technology (Wiley, New York, 1982), p. 197.
23. M. M. Frank, S. Sayan, S. Dörmann, T. J. Emge, L. S. Wielunski, E. Garfunkel, and Y. J. Chabal, Mater. Sci. Eng., B 109, 6 (2004).
24. D. A. Neumayer and E. Cartier, J. Appl. Phys. 90, 1801 (2001).
25. J. T. Fitch, S. S. Kim, and G. Lucovsky, J. Vac. Sci. Technol. A 8, 1871 (1990).
26. A. Kawamoto, J. Jameson, P. Griffin, K. Cho, and R. Dutton, IEEE Electron Device Lett. 22, 14 (2001).
27. M. Mayer, IPP Report No. 9/113, 1997 (unpublished).
28. P. Raghu, N. Rana, C. Yim, E. Shero, and F. Shadman, J. Electrochem. Soc. 150, F186 (2003).
29. D. L. Wood, K. Nassau, T. Y. Kometani, and D. L. Nash, Appl. Opt. 29, 604 (1990).
30. R. E. Hann, P. R. Suitch, and J. L. Pentecost, J. Am. Ceram. Soc. 68, 285 (1985).
31. W. Umrath, Fundamentals of Vacuum Technology. Leybold vacuum products and reference book 2001/2002 (Leybold, Cologne, 2001).
32. I. Abril, A. Gras-Martí, J. J. Jiḿnez-Rodríguez, V. Konoplev, J. C. Moreno Marín, and A. M. C. Ṕrez-Martín, Trends in Vacuum Sci. & Tech. 1, 251 (1993).
33. A. G. Znamenski and V. A. Marchenko, Tech. Phys. 43, 766 (1998).
34. B. Tsui and H. Chang, J. Appl. Phys. 93, 10119 (2003).
35. K. J. Hubbard and D. G. Schlom, J. Mater. Res. 11, 2757 (1996).
36. W. D. Kingery, Introduction to Ceramics (Wiley, New York, 1960).
37. L. Pantisano, J. Ramos, E. San Andŕs-Serrano, Ph. J. Roussel, W. Sansen, and G. Groeseneken, Proceedings of the 2006 IEEE International Conference on Microelectronic Test Structures, 2006 (unpublished), pp. 222-225.