Stabilization of higher- κ tetragonal Hf O2 by Si O2 admixture enabling thermally stable metal-insulator-metal capacitors

Applied Physics Letters

Volumn 91, Issue 7, 2007, Pages

  Boscke T S ^a,e   Govindarajan, S ^a,e   Kirsch, P D ^a   Hung, P Y ^a   Krug, C ^a,f   Lee, B H ^a   Heitmann, J ^b   Schroder U ^b   Pant, G ^c   Gnade, B E ^c   Krautschneider, W H ^d  

^a SEMATECH   (United States)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^c The University of Texas at Dallas

^d HAMBURG UNIVERSITY OF TECHNOLOGY   (Germany)

^e Qimonda Dresden ^*

^f FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC INSULATORS; LEAKAGE CURRENTS; THERMODYNAMIC STABILITY;

LOCAL DEFECTS; METAL CAPACITORS;

SILICA;

EID: 34548039733     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2771376     Document Type: Article

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